G - Physics – 05 – B
Patent
G - Physics
05
B
G05B 11/32 (2006.01) G01B 11/06 (2006.01) H01L 21/3205 (2006.01)
Patent
CA 2085143
An apparatus for controlling a process, in which a control system is structured by having a direct desired value (for example the film thickness d) as the control target, with an emissivity power ratio Ku * ([the .lambda. i power of .epsilon. 1]/[the .lambda. j power of .epsilon. 2]) used as an indirect desired value, and a measured value of emissivity power ratio Ku obtainable from detection signals (Si (S1, S2, ...) of a radiation sensor (160) used as an indirect controlled variable. A process manipulated variable (170) is automatically controlled in accordance with the direct desired value (actual film thickness) such that the indirect controlled variable attains an indirect desired value as target. Thus, the controlling effect of the control apparatus is improved by the use of the excellent control parameter.
Arai Kazuo
Marui Tomohiro
Kawasaki Steel Corporation
Robic
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