Method and apparatus for producing a relief pattern with a...

Details Method and apparatus for producing a relief pattern with a... Method and apparatus for producing a relief pattern with a...

G - Physics

06

K

88/0.21

G06K 1/12 (2006.01) B29C 59/02 (2006.01) G06K 19/16 (2006.01) B29C 35/08 (2006.01)

Patent

CA 1266194

ABSTRACT OF THE DISCLOSURE A method and apparatus for embossing a pattern having a microscopic relief structure, such as, for example, an optical diffraction grating, onto a layer of thermoplastic material is disclosed. A small circular region of a flexible embossing die is pressed against the thermoplastic layer by means of a punch. A fraction of the corresponding small circular region of the thermoplastic layer is then heated from the rear by a beam of radiant energy. The process may be repeated at all points on the thermoplastic layer where the pattern is desired.

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