H - Electricity – 05 – H
Patent
H - Electricity
05
H
358/25
H05H 1/46 (2006.01) H01J 37/32 (2006.01)
Patent
CA 1247757
ABSTRACT A large volume magnetoplasma is created by (a) establishing a plasma in an electrically isolated, tubular cavity formed by a cylinder containing a source of ions and electrons at low pressure, into which rf energy is coupled by an antenna alongside the cavity; and (b) allowing the plasma to extend into an adjoining auxiliary region which is connected to the cavity. The operating conditions in the cavity are such that the production of atomic species in the plasma is enhanced. The enhancement occurs when the operating conditions satisfy the relationships D.W.p ? 15,000 (I) and Image (II) where W is the power in watts applied to the antenna, D is the diameter of the plasma cavity in cm, p is the pressure in the cavity (and in the auxiliary region) expressed in millitorr, f is the frequency of the rf power in MHz, 1, is the length of the antenna in cm and B is the magnetic field in the cavity, established by a coil which surrounds the cavity, expressed in gauss. The large plasmas so produced are suitable for dry etching of semiconductor materials such as silicon wafers, for etching of polymers and for the surface treatments of other materials.
508219
Bereskin & Parr
The Australian National University
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