Method and apparatus for step and repeat exposures

B - Operations – Transporting – 23 – K

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B23K 26/02 (2006.01) B23K 26/06 (2006.01)

Patent

CA 2217018

An excimer laser projection ablation system provides less than the necessary amount of illumination to a substrate to completely ablate a structure. The system then moves the substrate a distance less than the image field at the substrate and provides an additional level of illumination. The system continues to move the substrate and provides additional illumination until the structures are fully ablated. The method and system for performing an improved step and repeat process preferably are used to create uniform repeating structures or three-dimensional structures.

Système d'ablation par projection d'un laser excimère assurant un éclairage du substrat qui est moins important que l'illumination nécessaire à l'ablation complète de cette structure. Le dispositif assure ensuite le déplacement du substrat selon une distance inférieure au champ de l'image au niveau de ce substrat puis fournit un niveau supplémentaire d'illumination. Il continue de déplacer le substrat et fournit une nouvelle illumination jusqu'à ce que les structures soient entièrement enlevées. Ce procédé et ce dispositif permettent de réaliser dans de meilleures conditions un processus itératif utilisé de préférence pour obtenir des structures répétitives ou tridimensionnelles uniformes.

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