G - Physics – 03 – C
Patent
G - Physics
03
C
96/247, 95/33.8
G03C 5/06 (2006.01) G03F 7/20 (2006.01)
Patent
CA 1164713
METHOD AND APPARATUS FOR TRANSFERRING PATTERNS Abstract of the Disclosure In transferring an image of d pattern from a master to a body, for example from a reticle to a photoresist-coated semiconductor wafer, it is proposed to avoid transferring opaque blemishes by exposing the body twice by way of a master comprising two identical pattern sets. The first exposure will produce on the body a latent image of one of the two pattern sets. The second exposure will superpose a latent image of the other of the two pattern sets upon the first latent image. A latent image of a blemish produced during the first exposure will he removed during the second exposure, and vice versa, since it is extremely unlikely that blemishes in the two parts of the master will coincide. Since the two identical pattern sets are on the same master, registration of the superposed latent images can be achieved very accurately. The invention finds application in making integrated circuits or solar cells using contact printing, proximity printing, or projection apparatus, for example wafer-steppers.
396231
Adams Thomas
Nortel Networks Limited
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