Method and apparatus for treating a gas

B - Operations – Transporting – 01 – D

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B01D 47/06 (2006.01) B01D 45/08 (2006.01) B01D 50/00 (2006.01)

Patent

CA 1043694

TITLE METHOD AND APPARATUS FOR TREATING A GAS ABSTRACT OF THE DISCLOSURE A vessel has an open top portion and a bottom wall. An inlet conduit extends axially through the bottom wall into the vessel and has an upper end portion terminate above the bottom wall to form an annular area between the inlet conduit and the vessel wall. A baffle plate is positioned above the upper end portion of the inlet conduit in spaced relation thereto with a clearance gap therebetween. The baffle has transverse dimensions less than the transverse dimensions of the vessel to form a peripheral gap between the baffle and the vessel wall. Spray nozzles are positioned above the baffle plate and below the baffle plate. A mist eliminator is positioned in the open top portion of the vessel to remove the liquid from the gas leaving the vessel. Untreated or dirty gas is introduced into the vessel through the inlet conduit at a preselected velocity. The untreated gas is impinged on the underside of the baffle plate and is deflected transversely through the clearance gap and a portion of the untreated gas flows upwardly through the peripheral gap and forms a primary vortex above the baffle plate. A second portion of the untreated gas is deflected downwardly and forms a secondary vortex in the annular area between the inlet conduit and the vessel wall. Liquid in droplet form is introduced into both the primary and secondary vortices without disrupting the stability of the vortices. A portion of the liquid in droplet form is circulated with the untreated gas in the primary and secondary vortices to treat the gas. The treated gas is withdrawn from the vessel through the open upper end portion and the liquid is collected in a reservoir adjacent the vessel bottom wall. - 2 -

198115

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