Method and apparatus for washing solid substrate with...

C - Chemistry – Metallurgy – 12 – Q

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C12Q 1/68 (2006.01) B08B 3/12 (2006.01)

Patent

CA 2495643

A method and apparatus for washing solid substrate with ultrasonic wave after hybridization reaction are provided. The method includes (1) putting the solid substrate into a container having a washing solution, on which the hybridization reaction has been completed, (2) using an ultrasonic generator to produce a certain strength of ultrasonic wave and transmit it into the washing solution, (3) washing the substrate by means of the cavitation effect being produced in the washing solution by the ultrasonic wave. Since the cavitation bubbles in the washing solution can produce intensive efflux and local microslipstream against the solid surface, evidently reduce the liquid surface tension and friction and enhance the liquid flow, non-specific adsorbate and deposit bound weakly on the solid substrate can be washed down rapidly.

L'invention concerne un procédé et un appareil permettant de laver un substrat solide à l'aide d'une onde ultrasonore après une réaction d'hybridation. Ledit procédé consiste 1) à placer le substrat solide dans un récipient contenant une solution de lavage dans laquelle une réaction d'hybridation été exécutée; 2) à utiliser un générateur ultrasonore pour produire une certaine intensité d'onde ultrasonore et à la transmettre dans la solution de lavage; (3) à laver le substrat à l'aide de l'effet de cavitation produit dans la solution ultrasonore par l'onde ultrasonore. Du fait que les bulles de cavitation de la solution de lavage peuvent produire un écoulement intense et un microécoulement local de filet d'eau contre la surface solide, réduire de manière évidente la tension et la friction de la surface du liquide et améliorer l'écoulement de liquide, un adsorbât et un dépôt non spécifiques faiblement fixés peuvent être rapidement éliminés par lavage.

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