Method and apparatus to produce large inductive plasma for...

Details Method and apparatus to produce large inductive plasma for... Method and apparatus to produce large inductive plasma for...

H - Electricity

05

H

H05H 1/00 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2376059

The inductive type plasma processing chamber (10) has two or more windows (22a, 22b) for receiving induced field energy. Each window enables induced field energy to enter the chamber from a respective direction. The plasma processing chamber further comprises one or more partitions to isolate spaces therein in associated with one or a group of windows (22a, 22b).

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