C - Chemistry – Metallurgy – 10 – K
Patent
C - Chemistry, Metallurgy
10
K
C10K 1/16 (2006.01) B01D 53/14 (2006.01) C01B 3/02 (2006.01) C01B 3/50 (2006.01) C10J 3/82 (2006.01) C10K 3/00 (2006.01)
Patent
CA 2694184
A method of assembling an acid gas component reduction system includes coupling at least one acid removal system in flow communication with at least one first synthetic gas (syngas) stream with at least one acid gas component having a first acid gas component concentration. The method also includes coupling at least one integral absorber in flow communication with the at least one acid removal system. The method further includes configuring the at least one integral absorber such that substantially continuous service of the at least one integral absorber facilitates producing a second syngas stream having a second acid gas component concentration that is less than the first acid gas component concentration.
L'invention concerne un procédé d'assemblage de système de réduction de composant gazeux acide. Le système comporte le couplage d'au moins un système d'enlèvement d'acide en communication fluidique avec au moins un premier flux de gaz synthétique (SYNGAS) comportant au moins un composant gazeux acide à une première concentration de composant gazeux acide ; la liaison d'au moins un dispositif d'absorption intégral en communication fluidique avec le ou les systèmes d'enlèvement d'acide ; la configuration du ou des absorbants intégraux pour que leur service sensiblement continu facilite la production d'un second flux de gaz de synthèse à une seconde concentration de composant gazeux acide inférieure à la première.
Naphad Sachin
Thacker Pradeep
Company General Electric
Craig Wilson And Company
LandOfFree
Method and apparatus to produce synthetic gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus to produce synthetic gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus to produce synthetic gas will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2001153