C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
204/29.5
C25D 3/50 (2006.01)
Patent
CA 1036534
ABSTRACT A composition for producing adherent deposits of palladium from cya- nide-free bath uses small amounts of cobalt or nickel or the combination there- of as the brightener. The bath employs as an electrolyte alkali metal and ammoni- um sulfates, sulfamates, phosphates, nitrates, nitrites and mixtures thereof. Preferably, the brightener concentration is 0.004-0.02 gram mole per liter nickel or 0.002-0.04 gram mole per liter cobalt, or the combination thereof. Cetyltrimethylammonium bromide is an optional component for the bath which is maintained at a pH of 7.5-11.0 and at a temperature of 28°-80° Centigrade. For barrel plating, the current density is 0.05-0.5 amperes per square decimeterand for rack plating the current density is 0.2-2.0 amperes per square decimeter.
217526
Skomoroski Robert M.
Zobbi Robert G.
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