Method and device for imaging a mask onto a substrate

Details Method and device for imaging a mask onto a substrate Method and device for imaging a mask onto a substrate

G - Physics

03

F

G03F 7/20 (2006.01)

Patent

CA 2482155

The invention relates to a method for imaging a mask (1) onto a substrate (2) by means of an illuminating unit (8) and an optical unit (9). The invention also relates to a device for carrying out the method. The aim of the invention is to create a method and a device which enable the mask (1) and the smaller structures thereof to be imaged onto the substrate (2) in a precise manner, with high functional reliability, and which enable the distortions of the substrate (2) to be corrected. To this end, the illuminating unit (8) and the optical unit (9) are displaced in relation to the mask (1) and the substrate (2), distortions of the substrate (2) are detected, and the imaging of the mask (1) is distorted according to the detected distortions by means of the optical unit (9) and is adapted to the distortions of the substrate (2).

L'invention concerne un procédé pour reproduire un masque (1) sur un substrat (2) au moyen d'une unité d'éclairage (8) et d'une unité optique (9). L'invention concerne en outre un dispositif pour la mise en oeuvre dudit procédé. L'objectif de l'invention est de concevoir un procédé et un dispositif permettant d'obtenir une reproduction précise du masque (1) et de ses structures de taille réduite sur le substrat (2), avec une grande sécurité de fonctionnement, et permettant de corriger des déformations du substrat (2). A cet effet, l'unité d'éclairage (8) et l'unité optique (9) sont déplacées par rapport au masque (1) et au substrat (2) de sorte que des déformations du substrat (2) soient détectées et de sorte que, en fonction des déformations détectées, la reproduction du masque (1) au moyen de l'unité optique (9) soit déformée et adaptée aux déformations du substrat (2).

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