Method and device for multi-cathode-pvd-coating and...

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H01J 37/34 (2006.01) C23C 14/35 (2006.01)

Patent

CA 2615235

The invention relates to a method for operating a multi-cathode-PVD-coating system. According to the invention, one part of the cathodes operates after the high power impulse cathodic sputtering which is assisted by magnetic fields and the remainder operates after the direct current magnetic field assisted cathodic sputtering. The high power impulse cathodic sputtering which is assisted by magnetic fields is used as a source of multi-ionised metal ions during the ion-assisted in vacuo pre-treatment of substrates, whilst both types of cathodic sputtering are always used simultaneously during coating and whilst both types of cathodes are connected to different materials.

L'invention concerne un procédé pour le fonctionnement d'une installation de revêtement par dépôt physique en phase gazeuse à plusieurs cathodes, selon lequel une partie des cathodes fonctionne après la pulvérisation cathodique à impulsions haute puissance assistée par champ magnétique et le reste des cathodes fonctionne après la pulvérisation cathodique à courant continu assistée par champ magnétique. Seule la pulvérisation cathodique à impulsions haute puissance assistée par champ magnétique est utilisée comme source d'ions métalliques ionisés plusieurs fois pendant le traitement préalable assisté par ions du substrat in vacuo, alors que les deux types de pulvérisation cathodique sont toujours mis en oeuvre simultanément pendant le revêtement et que les deux types de cathodes sont enduits de matériaux différents.

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