Method and device for processing or treating silicon material

C - Chemistry – Metallurgy – 01 – B

Patent

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C01B 33/02 (2006.01)

Patent

CA 2639972

A method is disclosed for processing or treating silicon material (3), for carrying out a purification process comprises the following steps: wetting silicon material (3), facing a first direction with a first liquid process medium (7), automatic changing of orientation of the silicon material (3) by means of a turning device and wetting the silicon material (3) in the altered orientation with the first liquid medium (7). Also disclosed is a corresponding cleaning device (1).

L'invention concerne un procédé de préparation et de traitement de matériau de silicium (3) pour réaliser un processus de nettoyage, ce procédé comprenant les opérations suivantes: humidifier le matériau de silicium (3) dirigé selon une première orientation spatiale au moyen d'un premier agent de traitement liquide (7), modifier automatiquement l'orientation du matériau de silicium (3) au moyen d'un dispositif d'inversion, humidifier le matériau de silicium (3) à orientation modifiée au moyen du premier agent de traitement liquide (7). Ce procédé est réalisé au moyen d'un dispositif de nettoyage (1) correspondant.

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