Method and installation for the densification of substrates...

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/04 (2006.01) C04B 35/83 (2006.01) C04B 41/45 (2006.01) C23C 16/455 (2006.01) C23C 16/44 (2006.01)

Patent

CA 2445501

The invention relates to a method for the densification of porous substrates by means of chemical vapour infiltration. The inventive method consists in: loading the porous substrates to be densified into the loading area of a chamber (10); heating the internal volume of the aforementioned chamber; and introducing a reactive gas into said chamber via an inlet which is disposed at one end of same. Before being brought into contact with the substrates (20) located in the loading area, the reactive gas admitted into the chamber is pre- heated at least partially by being passed through a conduit (30) which is connected to the gas inlet. Said conduit extends through the loading area and is brought to the internal temperature of the chamber. The pre-heated reactive gas is delivered into the loading area by means of one or more openings (33) which are disposed along the length of the side wall (32) of the conduit.

Un procédé de densification de substrats poreux par infiltration chimique en phase vapeur comprend le chargement de substrats poreux à densifier dans une zone de chargement d'une enceinte (10), le chauffage du volume interne de l'enceinte et l'introduction d'un gaz réactif dans l'enceinte à travers une entrée située à une extrémité de celle-ci. Avant sa venue au contact des substrats (20) situés dans la zone de chargement, le gaz réactif admis dans l'enceinte est préchauffé au moins en partie par passage dans un conduit (30) raccordé à l'entrée de gaz, s'étendant à travers la zone de chargement et porté à la température interne de l'enceinte, et le gaz réactif préchauffé est distribué dans la zone de chargement à travers une ou plusieurs ouvertures (33) formées dans la paroi latérale (32) du conduit, le long de celui-ci.

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