Method and installation for the vacuum colouring of a metal...

H - Electricity – 01 – J

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H01J 37/34 (2006.01)

Patent

CA 2628589

The invention relates to a magnetron sputtering method for the vacuum colouring of a metal strip (2) passing above at least one conductive counter electrode (3, 3') in a vacuum chamber (1). The inventive method consists in creating a plasma in a gas close to the metal strip (2), such as to generate radicals and/or ions that act on said strip (2), a magnetic confinement circuit (4) being positioned above the strip (2). The invention is characterised in that the counter electrode (3, 3') has a mobile surface which can move in rotation and/or translation in relation to the metal strip (2), said surface being moved during the colouring process and being continuously cleaned by a cleaning device (5, 5') which is obscured from the plasma before being exposed once again to said plasma. The invention also relates to a colouring installation for implementing said method.

L'invention concerne un procédé d'avivage sous vide par pulvérisation magnétron d'une bande métallique (2) défilant au-dessus d'au moins une contre- électrode (3, 3') en matériau conducteur dans une enceinte sous vide (1), dans lequel on crée un plasma dans un gaz à proximité de ladite bande métallique (2), de manière à générer des radicaux et/ou des ions agissant sur cette bande métallique (2), un circuit magnétique de confinement (4) étant placé au-dessus de ladite bande métallique (2), caractérisé en ce que ladite contre-électrode (3, 3') présente une surface mobile, en rotation et/ou en translation, par rapport à ladite bande métallique (2), ladite surface étant mise en mouvement lors de ravivage et étant nettoyée en continu par un dispositif de nettoyage (5, 5') placé dans l'ombre dudit plasma avant d'être à nouveau exposée audit plasma. Elle concerne également une installation d'avivage pour la mise en AEuvre du procédé.

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