Method and master for making a color selection mask for a...

Details Method and master for making a color selection mask for a... Method and master for making a color selection mask for a...

G - Physics

03

C

96/256, 95/0.8

G03C 5/00 (2006.01) B01D 45/12 (2006.01) G03B 27/28 (2006.01) G03F 7/20 (2006.01) H01J 9/14 (2006.01)

Patent

CA 1074171

ABSTRACT OF THE DISCLOSURE An apparatus and method for use in producing the il- lumination pattern and the pattern of electron-transmissive apertures in a color selection mask for a color cathode ray tube. The apparatus comprises a rigid, transparent substrate which has a first preselected optical density pattern of light-transmissive openings having substantially the same distribution as the first pattern but each opening having a second pattern of openings effectively establish upon a single exposure of a photoresist coated mask blank a double image exposure of the photoresist coating, the first image corresponding to the first pattern of openings. Each of the respective images is further capable of being separately developed and then etched in separate photoresist development and etching operations. -1-

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