Method and means for producing photomasks

Details Method and means for producing photomasks Method and means for producing photomasks

G - Physics

03

F

G03F 1/00 (2006.01) H05K 3/00 (2006.01)

Patent

CA 2074714

2074714 9111754 PCTABS00006 A novel photomask structure and method of producing photomasks using a non-contacting spark-discharge recording apparatus. The recording constructions of the present invention comprise a conductive layer, a layer transparent to the radiation that will be used to expose the target photosensitive material and, optionally, a coating layer deposited over the metal layer.

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