Method and system for automatically correcting aberrations...

Details Method and system for automatically correcting aberrations... Method and system for automatically correcting aberrations...

H - Electricity

01

J

355/15, 327/5

H01J 37/06 (2006.01) H01J 37/153 (2006.01) H01J 37/21 (2006.01)

Patent

CA 1040275

METHOD AND SYSTEM FOR AUTOMATICALLY CORRECTING ABERRATIONS OF A BEAM OF CHARGED PARTICLES Abstract of the Disclosure The location of a beam of charged particles within a deflec- tion field is determined by its orthogonal deflection voltages. With the location of the beam in the field, correction currants are supplied to a focus coil and to each of a pair of stigmator coils to correct for change of focal length and astigmatism due to the beam being deflected away from the center of its deflection field.

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