Method and system for coupling waveguides

Details Method and system for coupling waveguides Method and system for coupling waveguides

G - Physics

02

B

G02B 6/30 (2006.01)

Patent

CA 2523105

A method for photonically coupling to at least one active photonic device structure formed on a substrate, the method including: etching the active device structure (310) with a high selectivity towards a crystallographic plane to form a sloped terminus with respect to the substrate (370); and, depositing at least one waveguide (315) over the etched terminus and at least a portion of the substrate (370); wherein, the waveguide (315) is photonically coupled to the etched active device structure (310) to provide photonic interconnectivity for the etched active device structure.

L'invention concerne un procédé de couplage photonique avec au moins une structure de dispositif photonique actif formée sur un substrat. Ce procédé consiste : à graver ladite structure de dispositif actif, en fonction d'une sélectivité élevée, en direction d'un plan cristallographique, de sorte à former une paroi latérale inclinée par rapport au substrat ; et à déposer au moins un guide d'ondes sur la paroi latérale gravée et sur au moins une partie du substrat, le guide d'ondes étant couplé photoniquement à la structure de dispositif actif gravée, afin de fournir une interconnectivité photonique à la structure de dispositif actif gravée.

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