Method and system for manufacturing fine-grained silicon...

C - Chemistry – Metallurgy – 01 – B

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C01B 33/113 (2006.01) C01F 7/38 (2006.01) C01F 11/22 (2006.01) C01G 25/02 (2006.01)

Patent

CA 1317438

- 42 - ABSTRACT OF THE DISCLOSURE A method for manufacturing fine-grained SiO powder includes a step of heating a reagent mixture of SiO2 containing material and Si and/or C containing material for generating SiO vapor, and a step for condensing the generated SiO vapor in gaseous-state under the presence of non-oxidizing gas and under substantially low pressure. Preferably, maintaining the atmosphere pressure at the position where thermal reaction to generate SiO vapor occurs at substantially low pressure, causes flow of the non-oxidizing gas. Such gas flow serves as transfer medium for transferring vapor-state SiO and/or fine-grained SiO powder to a SiO collection chamber. This successfully prevent the SiO from being accumulated within a transfer pipe of duct and thus preventing the pipe or duct from being blocked. Furthermore, substantially low pressure atmosphere encourages SiO vapor generation from the reagent mixture and thus require lower heating temperature to cause SiO vapor generation.

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