Method, composition and system for the controlled release of...

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A01N 59/00 (2006.01) A01P 1/00 (2006.01) A23L 3/3445 (2006.01) A61L 2/20 (2006.01) A61L 9/015 (2006.01) B01D 53/38 (2006.01) C01B 11/02 (2006.01) C02F 1/50 (2006.01) C02F 1/76 (2006.01)

Patent

CA 2282348

Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.

La présente invention concerne un procédé, une composition et un système permettant de générer du dioxyde de chlore gazeux à dégagement contrôlé en combinant au moins un chlorite de métal et un matériau hydrophile solide sec qui réagit avec le chlorite de métal en présence de vapeur d'eau, sans réagir avec le chlorite de métal sensiblement en l'absence d'eau liquide ou à l'état de vapeur, de façon à produire du dioxyde de chlore gazeux en quantité régulière à raison de 0,001 à 1.000 ppm.

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