G - Physics – 01 – M
Patent
G - Physics
01
M
G01M 11/02 (2006.01) G02F 1/1333 (2006.01)
Patent
CA 2596125
The invention relates to a system, method and device for evaluating imperfections in a lens for a display for an electronic device. For the device, it comprises: a substrate; and a pattern imposed on the substrate. For the pattern, when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens. For the system, it comprises: an evaluation table for the lens, the table having a mounting area; and a substrate for mounting on the mounting area, the substrate having a pattern imposed thereon wherein when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens.
Mccarthy Tetrault Llp
Research In Motion Limited
LandOfFree
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