Method for automatic mask alignment

Details Method for automatic mask alignment Method for automatic mask alignment

H - Electricity

01

L

356/194

H01L 21/70 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1159579

METHOD FOR AUTOMATIC MASK ALIGNMENT ABSTRACT A method for aligning a mask with a microcircuit wafer, using a first target which is of a size that can be printed on a microcircuit chip without interfering with the lines thereon, and consisting only of lines vertically or diagonally disposed with respect to the image transducer. This target is exposed on at least two positions of the wafer, and the microcircuit is processed to include the first targets. A second mask to be exposed after the first mask has a diamond shaped target of a second size on at least two positions, and the first and second targets are centered one within the other prior to exposing the second mask.

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