Method for carbon film production

Details Method for carbon film production Method for carbon film production

C - Chemistry, Metallurgy

23

C

204/96.14

C23C 14/34 (2006.01) C23C 14/00 (2006.01) C23C 14/06 (2006.01)

Patent

CA 1309057

ABSTRACT OF THE DISCLOSURE A carbon film producing method utilizing a reactive sputtering process for projecting carbon particles from a graphite target electrode to deposite a very thin layer on a substrate. The reactive sputtering process is performed at a predetermined pressure in an atmosphere of hydrogen gas mixed at a predetermined ratio to another kind of gas. - 32 -

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