C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 4/12 (2006.01)
Patent
CA 2757074
A method is proposed for the coating of a substrate in which a starting material (P) is sprayed onto the substrate (10; 50) in the form of a process jet (2) by means of plasma spraying, with the starting material (P) being injected into a plasma which defocuses the process jet (2) and being melted partly or completely into a liquid phase (21) there at a low process pressure which is at most 20,000 Pa, wherein a gas flow for the process jet (2) is set such that the substrate (10; 50) is coated by deposition from the liquid phase (21) in at least one region (101) which is located in the geometric shadow with respect to the process jet (2).
L'invention concerne un procédé de revêtement d'un support, selon lequel une matière de départ (P) est pulvérisée par pulvérisation plasma sous forme d'un jet de traitement (2) sur le support (10; 50), la matière de départ (P) étant injectée sous faible pression de traitement ne dépassant pas 20 000 Pa dans un plasma défocalisant le jet de traitement (2), plasma dans lequel elle fond partiellement ou totalement en une phase liquide (21). Selon l'invention, un flux gazeux pour le jet de traitement (2) est réglé de façon que le support (10; 50) soit revêtu par dépôt à partir de la phase liquide (21) dans au moins une zone (101) qui se trouve dans l'ombre géométrique du jet de traitement (2).
Damani Rajiv J.
Gindrat Malko
Gowling Lafleur Henderson Llp
Sulzer Metco Ag
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