Method for decontaminating radioactively contaminated surfaces

G - Physics – 21 – F

Patent

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Details

G21F 9/00 (2006.01) G21F 9/28 (2006.01) G21F 9/30 (2006.01)

Patent

CA 2749642

The invention relates to a method for chemically decontaminating the surface of a metal component, wherein, in a first treatment step, an oxide layer formed on the component by corrosion of the material of said component is removed from the surface of the component by means of a first aqueous treatment solution containing an organic decontamination acid and in a subsequent second treatment step, the surface at least partially free of the oxide layer is treated with an aqueous solution containing an active component for removing particles which adhere to the surface. The active component consists of at least one anionic surfactant from the group consisting of sulphonic acids, phosphonic acids, carboxylic acids and salts of said acids.

L'invention concerne un procédé de décontamination chimique de la surface d'une pièce métallique, procédé selon lequel, au cours d'une première étape de traitement, une couche d'oxyde formée sur la pièce par la corrosion du matériau de la pièce est enlevée de la surface de la pièce à l'aide d'une première solution de traitement aqueuse contenant un acide de décontamination organique et, au cours d'une seconde étape de traitement subséquente, la surface au moins partiellement débarrassée de la couche d'oxyde est traitée à l'aide d'une solution aqueuse contenant un constituant actif permettant l'élimination des particules adhérant à la surface, le constituant actif étant composé d'au moins un tensioactif anionique du groupe constitué par les acides sulfoniques, les acides phosphoniques, les acides carboxyliques et les sels de ces acides.

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