Method for depositing a fluorinated layer from a precursor...

Details Method for depositing a fluorinated layer from a precursor... Method for depositing a fluorinated layer from a precursor...

B - Operations, Transporting

05

D

B05D 7/24 (2006.01) B05D 5/08 (2006.01)

Patent

CA 2698629

The present invention relates to a method for depositing a fluorinated layer on a substrate, comprising the injection of a gas mixture including a fluorinated compound and a carrier gas in a discharge or post-discharge area of a cold atmospheric plasma at a pressure comprised between 0.8 and 1.2 bars, characterized in that said fluorinated compound has a boiling temperature at a pressure of 1 bar above 25°C.

La présente invention se rapporte à un procédé pour déposer une couche fluorée sur un substrat, comprenant l'injection d'un mélange gazeux comportant un composé fluoré et un gaz porteur dans une zone de décharge ou de post-décharge d'un plasma froid atmosphérique à une pression comprise entre 0,8 et 1,2 bar, caractérisé en ce que ledit composé fluoré a une température d'ébullition à une pression de 1 bar supérieure à 25°C.

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