Method for determining and evaluating defects in a sample...

G - Physics – 01 – N

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G01N 21/88 (2006.01) G06T 7/00 (2006.01)

Patent

CA 2437005

In this method, the surface to be investigated is first of all exposed to collimated light and the radiation rejected therefrom supplied to a position-resolving image processing means. Then, a mask is generated on the basis of the image supplied by the image processing means, said mask having masked regions being defined by relatively bright areas of said image and unmasked regions being defined by relatively dark areas of said image. Now, the surface to be investigated is exposed to diffuse light and the radiation rejected therefrom supplied to the image processing means, with only the radiation from the unmasked regions being taken into consideration for analyzing purposes.

L'invention concerne un procédé, selon lequel une lumière collimatée est d'abord envoyée sur une surface à sonder et le rayonnement renvoyé par cette surface est acheminé vers un dispositif de traitement d'images à résolution locale. Sur la base de l'image fournie par le dispositif de traitement d'images, un masque est ensuite réalisé, dans lequel des zones masquées sont définies par des champs d'image relativement clairs et des zones non masquées par des champs d'image relativement foncés. Puis la surface à sonder est exposée à une lumière diffuse et le rayonnement renvoyé acheminé vers le dispositif de traitement d'images, seul le rayonnement des zones non masquées étant pris en considération lors de l'analyse.

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