Method for determining distances from a device to at least a...

G - Physics – 01 – V

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G01V 3/38 (2006.01)

Patent

CA 2593526

A method for determining at least first and second distances from a device to at least a first layer and a second layer in a formation, whereby at least one of the first and second layers comprises an electromagnetic induction anomaly, the device comprising a transmitter for transmitting electromagnetic signals through the formation and a receiver for detecting responses. In the method, a device is brought inside a wellbore in the formation, an electromagnetic signal transmitted using the transmitter, one of apparent conductivity and apparent resistivity calculated based on a receiver-detected response and monitored over time. The first and second distances are determined based on observed changes of the one of apparent conductivity and apparent resistivity.

La présente invention concerne un procédé permettant de déterminer au moins les première et seconde distances entre un périphérique et au moins une première et une deuxième couches d~une formation, où au moins une des première et deuxième couches comprend une anomalie d~induction électromagnétique, le périphérique comprenant un transmetteur transmettant des signaux électromagnétiques par la formation et un récepteur détectant les réponses. Dans ce procédé, un périphérique est sondé dans la formation, un signal électromagnétique transmis au moyen du transmetteur, une conductivité apparente ou une résistance apparente calculée selon la réponse détectée par le récepteur et surveillée tout le long de l~opération. Les première et seconde distances sont déterminées selon les modifications observées de la conductivité ou la résistance apparentes.

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