Method for determining the position of a sensor element

Details Method for determining the position of a sensor element Method for determining the position of a sensor element

G - Physics

01

V

G01V 3/08 (2006.01) A61B 5/06 (2006.01) G01B 7/004 (2006.01)

Patent

CA 2441226

The invention relates to a method for determining the position of a sensor element (300), according to which a magnetic alternating field (210) emitted by at least one field generating unit (200) is measured. The position of the sensor element (300) is determined on the basis of a signal received in the sensor element (300). The inventive method is further characterized in that interference fields (410) are calculated, preferably to a first approximation, said interference fields being caused by eddy currents (420) produced in electrically conductive objects (400). The position that can be determined on the basis of the signal received in the sensor element (300) is corrected on the basis of the calculated interference fields (410).

L'invention concerne un procédé pour déterminer la position d'un élément détecteur (300) permettant de mesurer un champ alternatif (210) émis par au moins une unité génératrice de champ (200). La position de l'élément détecteur (300) est déterminée sur la base d'un signal reçu dans ce dernier (300). Selon l'invention, des champs parasites (410), apparaissant en raison de courants parasites (420) générés dans des objets électroconducteurs (400), sont calculés de préférence lors de la première approximation. En outre, la position, pouvant être déterminée d'après le signal reçu dans l'élément détecteur (300), est corrigée sur la base des champs parasites calculés (410).

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