G - Physics – 03 – F
Patent
G - Physics
03
F
96/266
G03F 7/36 (2006.01)
Patent
CA 1049313
METHOD FOR DEVELOPING A PHOTOSENSITIVE RESIN PLATE Abstract of the Disclosure A method for developing a photosensitive resin plate after exposure to make an image, which comprises applying suction to the surface of the photosensitive layer of the exposed plate so as to remove the resin composition at the non-exposed and non-hardended portion of the photosensitive layer.
223660
Furuta Akihiro
Sano Takezo
Uemura Yukikazu
Na
Sumitomo Chemical Company
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