Method for developing a photosensitive resin plate

G - Physics – 03 – F

Patent

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96/266

G03F 7/36 (2006.01)

Patent

CA 1049313

METHOD FOR DEVELOPING A PHOTOSENSITIVE RESIN PLATE Abstract of the Disclosure A method for developing a photosensitive resin plate after exposure to make an image, which comprises applying suction to the surface of the photosensitive layer of the exposed plate so as to remove the resin composition at the non-exposed and non-hardended portion of the photosensitive layer.

223660

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