Method for developing residual-moisture photographs

Details Method for developing residual-moisture photographs Method for developing residual-moisture photographs

G - Physics

03

D

95/86, 95/90

G03D 3/00 (2006.01) G03C 5/04 (2006.01)

Patent

CA 1115577

ABSTRACT OF THE DISCLOSURE For developing residual-moisture photographs according to the wet- film technique, a pre-treatment with a first solution of about 5% ethanolic NaOH is performed first at about 13°C. After the alkali exchange, the exposed film passes through a bath at a bath temperature of 50°C with a hydroquinone- containing photographic developer. This "Two-bath wet developing method" takes place in daylight. The developed, fixed, rinsed and dried film can be evaluated directly.

311208

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