Method for double-dip substrate spin optimization of coated...

Details Method for double-dip substrate spin optimization of coated... Method for double-dip substrate spin optimization of coated...

B - Operations, Transporting

05

D

B05D 1/30 (2006.01) B05D 1/18 (2006.01)

Patent

CA 2569971

The present invention discloses a method for preparing a substrate coated support for use in micro-array devices. The method of the present invention comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat and subjecting the coated support to centripetal forces for a second time to produce a substrate coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface.

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