Method for embossing holograms

Details Method for embossing holograms Method for embossing holograms

G - Physics

03

H

G03H 1/02 (2006.01) B29C 43/22 (2006.01) B29C 59/04 (2006.01)

Patent

CA 2067731

2067731 9108524 PCTABS00005 In a method for producing a material embodying an interference pattern, for example a holographic image, the interference pattern is introduced into a transparent release layer (2) situated on a plastic basefilm (1), by forming said pattern in the release layer (2), applying the substrate (11) onto the finished release layer (2) and removing the substrate (11) together with the release layer (2) from the plastic base film (1). In a first embodiment, the plastic base film (1) is embossed with the interference pattern and the transparent release layer (2) is then applied to the embossed side of the plastic base film (1). In a second embodiment, the transparent release layer (2) is applied to the plastic base film (1) and the transparent release layer is then embossed with the interference pattern.

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