Method for fabricating multisegment ridge waveguides

Details Method for fabricating multisegment ridge waveguides Method for fabricating multisegment ridge waveguides

H - Electricity

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L

H01L 21/302 (2006.01) G02B 6/12 (2006.01) G02B 6/136 (2006.01) G03F 7/26 (2006.01) H01L 21/306 (2006.01) H01L 21/308 (2006.01)

Patent

CA 2168172

A process for fabricating multisegment ridge waveguides is disclosed which is self-aligning and avoids unnecessary masking and etching steps. The process essentially comprises five steps: removing, in a starting layer structure, a top layer (DS) on both sides of areas where segment transitions (ST) are to be formed; depositing a metal contact layer (KN); etching a desired ridge-waveguide structure (R); covering the entire area except-the segment transition areas with photoresist; and removing the contact layer (KM) in the segment transition areas by a lift-off step, thus providing electrical separation between the individual segments.

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