Method for fabricating planar optical waveguide devices

Details Method for fabricating planar optical waveguide devices Method for fabricating planar optical waveguide devices

G - Physics

02

B

G02B 6/13 (2006.01) G02B 6/132 (2006.01) G02B 6/12 (2006.01)

Patent

CA 2314957

Proposed is a method for fabricating a planar optical waveguide device having a plurality of core segments (4, 14, 24, 34, 44) formed between a lower clad layer (2, 3, 12, 13, 23, 33, 43) and an upper clad layer (5, 15, 25, 35, 45), in which a hot isostatic pressing process (HIP) is carried out during the fabrication process. The lower clad layer may consist of a substrate (2, 12) or a buffer layer (3, 13, 23, 33, 43) formed on a substrate. Each layer may be formed either by a low-temperature film-forming process such as CVD or by the flame hydrolysis pressing process. The HIP process is also effective in eliminating voids when the core is formed in a recess of the lower clad layer. According to the tests conducted by the inventors, it was found that the HIP process can be conducted without requiring any protective layer or a gas barrier through proper selection of the condition for the HIP process, as opposed to the common belief that a protective layer or a gas barrier is essential for the HIP process.

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