Method for fabrication of semiconductor device

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 21/44 (2006.01) H01L 23/34 (2006.01) H01L 27/10 (2006.01)

Patent

CA 2509673

A novel method is presented to provide ASICs with drastically reduced NRE and with volume flexibility. The invention includes a method of fabricating an integrated circuit, including the steps of: providing a semiconductor substrate, forming a borderless logic array including a plurality of Area I/Os (36) and also including the step of forming redistribution layer (32) for redistribution at least some of the Area I/Os for the purpose of the device packaging. The fabrication may utilize Direct Write e-Beam for customization. The customization step may include fabricating various types of devices at different volume from the same wafer.

La présente invention concerne un nouveau procédé de production de circuits intégrés spécifiques (type ASIC) ayant un NRE réduit de manière stricte et une souplesse au niveau du volume. Cette invention concerne un procédé de fabrication d'un circuit intégré qui comprend les étapes suivantes: on utilise un substrat à semi-conducteurs, on forme un réseau logique sans frontière comprenant une pluralité d'entrées/sorties de zone, et comprenant également l'étape de formation d'une couche de redistribution afin de redistribuer au moins certaines entrées/sorties de zone en vue de conditionner le dispositif. Pour la fabrication, on peut utiliser un faisceau direct d'électrons d'écriture pour la fabrication sur mesure. L'étape de fabrication sur mesure peut consister à fabriquer divers types de dispositifs ayant un volume différent à partir de la même tranche.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method for fabrication of semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabrication of semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabrication of semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1560671

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.