Method for finely polishing/structuring thermosensitive...

B - Operations – Transporting – 23 – K

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B23K 26/06 (2006.01) B23K 26/00 (2006.01)

Patent

CA 2604641

The invention relates to a method for finely polishing/structuring thermosensitive dielectric materials, in particular materials exhibiting a low thermal expansion coefficient, by a laser beam consisting in directing an intensive ultrashort laser beam to a processable material surface, in adjusting the action time within a range from 10-13 s to 10-11 s and a laser pulse energy in such a way that it is less than an ablation threshold but sufficient for provoking a Coulomb explosion. The inventive method makes it possible to carry out a material removal within a nanometer range by means of laser ultrashort pulses ranging between picoseconds and subpicoseconds, wherein the material surface is finely polished during a pre-ablation process step (removal less than the ablation range) and the processable surface is low- heated (approximately up to 10~C, only) due to the extremely shot laser beam action time.

La présente invention concerne un procédé de polissage fin/structuration de matières diélectriques thermosensibles, présentant notamment un faible coefficient de dilatation thermique, au moyen d'un rayonnement laser. Ce procédé consiste à orienter un rayonnement laser intense ultracourt sur une surface de la matière à traiter. Le temps d'action du rayonnement laser sur la surface est réglé entre 10-13 s et 10-11 s et l'énergie des impulsions laser est inférieure au seuil d'ablation, mais suffisante pour l'apparition d'une explosion de Coulomb. Ce procédé permet de réaliser un enlèvement de matière de l'ordre du nanomètre avec des impulsions laser ultracourtes dans la plage des picosecondes et des subpicosecondes et la surface de la matière est soumise à un polissage fin lors d'une étape du procédé préablation (enlèvement inférieur au seuil d'ablation). On observe un très faible réchauffement, seulement d'environ 10 degrés, en raison du temps d'action extrêmement court du rayonnement laser sur la surface à traiter.

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