Method for formation of coating film of silicon oxide

Details Method for formation of coating film of silicon oxide Method for formation of coating film of silicon oxide

C - Chemistry, Metallurgy

09

D

6/226, 117/237

C09D 1/00 (2006.01) C04B 41/06 (1980.01)

Patent

CA 1185056

Abstract: The invention provides a method for the formation of a coating film of silicon oxide on the surface of an inorganic substrate by applying a coating composition comprising a silicon compound onto the surface to form a coating composition layer, and then subjecting the surface having the coating composition layer thereon to a heat treatment to form a coating film of silicon oxide. The coating composition comprises a polar organic solvent having silicic acid dissolved therein, the molar ratio of water to silicic acid therein being not more than 5. The coating film thus formed is uniform and does not have any pinholes or cracks.

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