Method for forming a planarized thin film

Details Method for forming a planarized thin film Method for forming a planarized thin film

C - Chemistry, Metallurgy

23

C

117/62, 204/96.0

C23C 14/00 (2006.01) H01L 21/263 (2006.01) H01L 21/321 (2006.01) H01L 21/768 (2006.01)

Patent

CA 1247464

ABSTRACT OF THE DISCLOSURE Charged particles are irradiated over a thin film formed on a convex and concave surface of a substrate or over a thin film being formed on a convex and concave surface of a substrate. During the irradiation, raise in temperature of the thin film and impingement of charged particles cause the fludization of the thin film, so that a planarized thin film is formed within a short period of time. - 1 -

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