Method for forming a platinum resistance thermometer

G - Physics – 01 – K

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26/201, 73/72

G01K 7/16 (2006.01) H01C 7/02 (2006.01) H01C 17/12 (2006.01)

Patent

CA 1258981

METHOD FOR FORMING A PLATINUM RESISTANCE THERMOMETER ABSTRACT OF THE DISCLOSURE A platinum resistance thermometer is formed in a process which includes the defining of a path for the resistance thermometer in an inert material deposited in a layer on the substrate. The substrate surface is exposed in the path, and the inert material forms a negative pattern for the path. The resistive material for the thermometer is then deposited on both the substrate surface exposed in the path and on the surfaces of the inert material remaining on the substrate. After this, the inert material is etched away, and the resistive material deposited on top of the inert material is then loose and can be removed leaving a strip of resistive material in the desired path for forming the resistive thermometer. The strip has low contamination and impurities to more easily reach the desired temperature coefficent of resistance of the strip forming the thermometer.

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