Method for forming micro groove structure

Details Method for forming micro groove structure Method for forming micro groove structure

G - Physics

03

F

G03F 7/00 (2006.01) B81C 1/00 (2006.01) G02B 5/18 (2006.01) G02B 6/122 (2006.01) G03F 7/36 (2006.01) H01L 21/768 (2006.01)

Patent

CA 2423527

A method of forming a micro groove structure according to the invention has the steps of: (a) forming a mask pattern on a substrate capable of being subjected to dry etching; (b) dry etching the substrate having the mask pattern formed thereon; (c) vapor-phase forming a thin film of a masking material for the dry etching, on a non-etched surface portion of the substrate after the dry etching; and (d) dry etching the substrate having the thin film formed thereon. The steps (a) to (d) are carried out successively.

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