C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/34 (2006.01) A47J 36/02 (2006.01) C23C 14/06 (2006.01) C23C 14/58 (2006.01) C23C 16/56 (2006.01)
Patent
CA 2065303
Abstract of the Disclosure The present invention relates to a titanium nitride film forming method employing an ion-plating method to produce good decorative properties, to a titanium nitride film forming method which can maintain the stability of the color tone even under high temperatures, and to the vessel obtained through the above methods. The titanium nitride film-forming method used in the present invention is; (1) a titanium nitride film-forming method wherein a titanium nitride film is formed over the surface of a substrate by either the physical metalizing method or the chemical metalizing method, (2) a titanium nitride film-forming method wherein a titanium nitride film is formed over the surface of a substrate, and the substrate is, then, heated in a mixed atmosphere of oxygen and nitrogen, thereby forming a transparent and stable titanium oxide film over the surface of the titanium nitride film, and (3) the titanium nitride film forming method wherein a titanium nitride film is formed over the surface of a substrate, and the substrate is, then, heated in an nitrogen atmosphere, thereby effecting a color tone stabilizing treatment which diffuses nitrogen into the titanium nitride film. The respective titanium nitride film-forming methods are used to provide a vessel manufactured by forming the titanium nitride film over the surface of the vessel's substrate.
Kanno Hiroshi
Nagaoka Hitoshi
Marks & Clerk
Niigata Engineering Co. Ltd.
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