Method for generating a lattice structure with a phase shift...

Details Method for generating a lattice structure with a phase shift... Method for generating a lattice structure with a phase shift...

G - Physics

02

B

345/32, 88/0.21

G02B 5/18 (2006.01) G02B 5/32 (2006.01) G03F 7/00 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1290601

ABSTRACT OF THE DISCLOSURE A method for generating a lattice structure with a phase shift on a surface of a substrate characterized by the steps of exposing of a photo-sensitive surface in an optical interference field and then subsequently exposing the same surface to a second interference field with the spatial frequencies of the two interference fields being changed a small amount between the two exposures. The photo-sensitive surface can be a photoresist layer applied on the substrate. After developing of the layer, this lattice structure is produced by etching. Another embodiment of the method is produced by means of a laser-active etching wherein the photo-sensitive surface is composed of a substrate surface in contact with an etchant and the etchant reaction is activated by the exposure.

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