C - Chemistry – Metallurgy – 21 – C
Patent
C - Chemistry, Metallurgy
21
C
C21C 5/32 (2006.01) B01F 3/04 (2006.01) B01F 5/02 (2006.01) B01J 10/00 (2006.01) C21C 5/46 (2006.01) F23D 14/22 (2006.01) C21C 7/072 (2006.01)
Patent
CA 2232215
A method for introducing gas into a liquid wherein a gas stream is ejected from a lance spaced above the liquid surface and directed from the lance onto the liquid surface. The gas retains substantially all its original jet axis velocity when it contacts the liquid surface, and substantially all of the gas penetrates the liquid surface and is introduced into the liquid. Preferably the gas stream is surrounded by a flame envelope running from the lance to the liquid surface, which shields the gas from ambient gas entrainment. The gas stream preferably forms a gas cavity within the liquid having a diameter substantially the same as the diameter of the gas stream as it is ejected from the lance.
Méthode pour introduire un gaz dans un liquide. Selon la méthode, un flux gazeux est éjecté à partir d'une lance placée à distance au-dessus de la surface liquide. Le flux est dirigé de la lance sur la surface liquide. Le gaz conserve essentiellement toute sa vélocité originale de l'axe de jet lorsqu'il entre en contact avec la surface liquide. De préférence, le flux gazeux est entouré par une enveloppe de flamme s'étendant de la lance à la surface liquide, laquelle enveloppe empêche le flux gazeux d'être entraîné par les gaz ambients. De préférence, le flux gazeux forme dans le liquide une cavité gazeuse dont le diamètre est essentiellement égal à celui du flux gazeux à sa sortie de la lance.
Anderson John Erling
Mathur Pravin Chandra
Selines Ronald Joseph
Praxair Technology Inc.
Sim & Mcburney
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