G - Physics – 03 – C
Patent
G - Physics
03
C
96/21, 96/219
G03C 11/00 (2006.01) G03F 7/04 (2006.01)
Patent
CA 1061161
METHOD FOR MAKING AN ETCH-RESISTANT STENCIL ABSTRACT OF THE DISCLOSURE The method comprises applying to a surface to he etched a coaling of a liquid composition having a pH between 5.8 to 7.0 and comprising an alkali caseinate, an alkali dichromate photosensitizer, and water. The layer is dried, photoexposed, developed, and then baked to produce an etch-resistant stencil. -1-
234436
Doerschuk Ernest E. (iii)
Piascinski Joseph J.
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