Method for making electronic devices having a dielectric...

H - Electricity – 01 – L

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H01L 51/00 (2006.01)

Patent

CA 2582332

A method of making an electronic device by (a) depositing a substantially nonfluorinated polymeric layer onto a dielectric layer using a plasma-based deposition technique selected from the group consisting of (i) plasma polymerizing a precursor comprising monomers, and (ii) sputtering from a target comprising one or more polymers of interpolymerized units of monomers, the monomers being selected from the group consisting of aromatic monomers, substantially hydrocarbon monomers, and combinations thereof; and (b) depositing an organic semiconductor layer adjacent to said polymeric layer.

L'invention concerne un procédé de fabrication d'un dispositif électronique consistant : (a) à déposer une couche polymère sensiblement non fluorée sur une couche diélectrique au moyen d'une technique de déposition fondée sur le plasma et sélectionnée dans le groupe comprenant : (i) la polymérisation par plasma d'un précurseur comprenant des monomères et (ii) la pulvérisation à partir d'une cible comprenant un ou plusieurs polymères de motifs interpolymérisés de monomères, ceux-ci étant sélectionnés dans le groupe renfermant des monomères aromatiques, des monomères sensiblement hydrocarbonés et des combinaisons de ceux-ci ; et (b) à déposer une couche semi-conductrice organique de manière adjacente à la couche polymère.

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