C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
260/613
C07F 9/92 (2006.01) C07C 43/225 (2006.01) C07F 9/68 (2006.01) C07F 9/90 (2006.01)
Patent
CA 2023392
RD-19,343 METHOD FOR MAKING OCTYLOXY SUBSTITUTED DIPHENYL IODONIUM HEXAFLUORO METALLOID SALTS Abstract of the Disclosure A one pot method is provided for preparing an (octyloxyphenyl) phenyliodonium tosylate and the corresponding hexafluorometalloid salt. n-Octylphenyl ether is initially prepared using a halooctane and phenol in the presence of a phase transfer catalyst followed by the addition of iodobenzene, a peracid, and p-toluene sulfonic acid. The resulting (octyloxyphenyl)phenyl iodonium tosylate can be directly methathesized after an optional treatment step with an alkali metal hexafluoroantimonate salt. The (octyloxyphenyl)phenyl iodonium hexafluorometalloid salt can be used as a photoinitiator for UV curable organic materials such as epoxy resins.
Crivello James Vincent
Fukuyama James Mitsugu
Lee Julia Lam
Company General Electric
Craig Wilson And Company
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