C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
75/2, 204/26, 20
C25D 3/56 (2006.01) C30B 35/00 (2006.01)
Patent
CA 1037414
METHOD FOR MAKING THIN FILM TUNGSTEN-THORIUM ALLOY ABSTRACT OF THE DISCLOSURE A thin film tungsten-thorium alloy is fabricated by a method using an electroplating technique. A conductive substrate is situated in a heated plating bath and forms the cathode of the electrical system. The plating bath comprises a first aqueous solution consisting of WO3, Na3PO4 and H2O. The thin film of tungsten-thorium alloy is formed by concurrently passing electrical current through the heated plating bath containing the substrate and adding a second aqueous solution consisting of Th(SO4)2 and H2O to the first solution at a predetermined rate. In some applications, the W-Th alloy subsequently remains as a layer on the object on which it is deposited. In other applications, it is sub- sequently completely or partially removed from the object. Also, in applications where it is desired to have the W-Th alloy in a single cry- stal state, it is subsequently annealed.
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