Method for making visible residual moisture distributions in...

Details Method for making visible residual moisture distributions in... Method for making visible residual moisture distributions in...

G - Physics

03

C

96/1, 150/22

G03C 5/26 (2006.01) G03C 5/04 (2006.01)

Patent

CA 1168497

ABSTRACT OF THE DISCLOSURE The invention relates to a method for making visible by photochemical means residual moisture distributions in photographic wet film layers subjected to a gas flow. According to the invention, a film diffusely pre-exposed is immersed in an aqueous swelling agent solution which contains either (a) a reducing agent or (b) an alkali. After being exposed to the air stream, the invisible residual moisture profile is immersed in an alcoholic solution of either (a) an alkali or (b) a reducing agent. The half-tone image produced serves for determining stationary local boundary layer thickness distributions, wall shearing stresses, material transfer coefficients and heat transfer coefficients.

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